CVI Laser Optics反射鏡TLMB-800-45-1025

時(shí)間：2024/3/16閱讀：778

產(chǎn)品介紹：

CVI反射鏡，是高質(zhì)量的光學(xué)反射鏡選擇，廣泛應(yīng)用于各類高功率及精密激光應(yīng)用中。鏡片面型精度、鍍膜損傷閾值高，堅(jiān)固耐用并為客戶提供優(yōu)像質(zhì)。光學(xué)誤差RMS低于λ/50，表面粗糙度可達(dá)3-5?。

是目前國內(nèi)高校、研究所及高功率/高性能光學(xué)實(shí)驗(yàn)室的選！

主要應(yīng)用:

l 激光諧振腔鏡

l 光路偏轉(zhuǎn)

l 各類激光加工設(shè)備

產(chǎn)品參數(shù)：

類別	系列代碼	波長范圍nm	反射率	直徑mm	面型精度	表面質(zhì)量	損傷閾值
窄帶部分反射鏡	PR1	190-2100	30-90%	12.7-50.8	λ/10	10-5	20 J/cm2, 20ns, 20Hz at 1064nm, 10 MW/cm2 at 1064nm
窄帶可調(diào)全反鏡	TLM1	190-2100	R ≥ 99.0% at 0° R ≥ 98.5% at 45°, P-Pol R ≥ 99.0% at 45°, UNP R ≥ 99.5% at 45°, S-Pol	12.7-101.6	λ/10	10-5	20 J/cm2, 20ns, 20Hz at 1064nm, 10 MW/cm2 at 1064nm
光纖全反鏡	FLM	343, 515, 1030, 1064, 1070, 1550nm	R ≥ 99.0% at 0° R ≥ 99.0% at 45°, UNP	12.7-50.8	λ/10	10-5	20 J/cm2, 20ns, 20Hz at 1064nm, 10 MW/cm2 at 1064nm
準(zhǔn)分子全反鏡	ARF	193	R ≥ 97% at 0° R ≥ 96.0% at 45° UNP	25.4-76.2	λ/10	10-5	1 J/cm2, 20ns pulse at 193nm
準(zhǔn)分子全反鏡	KRF	248	R ≥ 99.5% at 0° R ≥ 99.0% at 45°, UNP	25.4-76.2	λ/10	10-5	3 J/cm2, 8ns pulse at 248nm
YAG全反鏡	Y5	213	R ≥ 97.0% at 0° R ≥ 97.0% at 45°, UNP	12.7-50.8	λ/10	10-5	3 J/cm2, 8ns pulse at 248nm
	Y4	262-266	R ≥ 99.9% at 0° R ≥ 99.6% at 45°, P-Pol R ≥ 99.8% at 45°, UNP R ≥ 99.9% at 45°, S-Pol	12.7-101.6	λ/10	10-5	10 J/cm2, 20ns, 20Hz at 266nm
	Y3	349-355	R ≥ 99.9% at 0° R ≥ 99.6% at 45°, P-Pol R ≥ 99.8% at 45°, UNP R ≥ 99.9% at 45°, S-Pol	12.7-101.6	λ/10	10-5	15 J/cm2, 20ns, 20Hz at 355nm
	Y2	523-532	R ≥ 99.9% at 0° R ≥ 99.6% at 45°, P-Pol R ≥ 99.8% at 45°, UNP R ≥ 99.9% at 45°, S-Pol	12.7-101.6	λ/10	10-5	20 J/cm2, 20ns, 20Hz at 532nm
	Y1	1047-1064	R ≥ 99.9% at 0° R ≥ 99.6% at 45°, P-Pol R ≥ 99.8% at 45°, UNP R ≥ 99.9% at 45°, S-Pol	12.7-101.6	λ/10	10-5	25 J/cm2, 20ns, 20Hz at 1064nm
	Y1S, Y2S, Y3S, Y4S	266, 355, 532, 1064	R ≥ 99.9% at 0° R ≥ 99.9% at 45°, P-Pol R ≥ 99.9% at 45°, S-Pol	25.4	λ/10	10-5	40 J/cm2, 20ns, 20Hz at 1064nm
雙波長反射鏡	HM	1064/532	R ≥ 99% at 1064 and 532nm	12.7-50.8	λ/10	10-5	8 J/cm2, 20ns, 20Hz at 1064nm, 3 J/cm2, 20ns, 20Hz at 532nm
雙波長反射鏡	YH	1064/633	R ≥ 99% at 1064nm R ≥ 80% at 633nm	25.4-50.8	λ/10	10-5	8 J/cm2, 20ns pulse at 1064nm
寬帶反射鏡	TLM2	450nm to 2100nm	R > 99.5% at 0° incidence R >99.0% at 45° incidence	12.7-25.4	λ/10	10-5	500 mJ/cm2, 20ns, 20Hz at 1064nm
寬帶反射鏡	MPQ	245 – 390 (UV) 420 – 700 (VIS)	Ravg≥ 98% from 245 – 390nm at 0° - 45° Ravg≥ 98% from 420 – 700nm at 0° - 45°	25.0	λ/4	60-40	0.5 J/cm2, 10ns at 532nm
鈦寶石超快反射鏡	TLMB	740 – 860	R > 99.0% from 740 – 860nm	25.0-101.6	λ/10	40-20	8 J/cm2, 300 ps, 20Hz at 800nm
金屬鍍膜反射鏡	VUVA	157 – 190	R > 85% at 157nm by design	25.4-50.8	λ/10	40-20	低功率應(yīng)用
	DUVA	193 – 1200	R > 90% at 193nm Ravg≥ 85% at 400 – 1200nm	12.7-50.8	λ/10	40-20
	PAUV	250 – 600	Ravg ≥ 85% (250 – 600nm)	12.7-76.2	λ/10	40-20
	PAV	400 – 800	Ravg ≥ 87% (400 – 800nm)	12.7-76.2	λ/10	40-20
	EAV	450 – 650	Ravg ≥ 92% (450 – 650nm)	12.7-76.2	λ/10	40-20
	PS	400 – 20,000	Ravg ≥ 95% (400nm to 20 µm)	12.7-76.2	λ/10	40-20
	PG	650 – 20,000	Ravg ≥ 95.5% (650 – 1700nm) Ravg ≥ 98.0% (2 – 16 µm)	12.7-76.2	λ/10	40-20

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CVI Laser Optics反射鏡TLMB-800-45-1025

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